报告题目：Nanofabrication by nanoimprint and electron beam lithography and applications

报告人：崔波教授（加拿大滑铁卢大学）

时间：2018年12月28日（星期五）下午14:30-16:30

地点：机械楼531 报告厅

报告摘要：

E-beam lithography (EBL) and nanoimprint lithography (NIL) are two most popular nanolithography techniques. EBL is based on material (called resist) property modification by its exposure to focused electron beam; whereas NIL relies on the mechanical conformation of a low viscosity resist to the structures of a mold. NIL offers high resolution (2nm), high throughput (up to onewafer/minute), low cost and high pattern transfer fidelity.

In the talk, I will first present EBL resist with a focus of polystyrene that can achieve ultra-high sensitivity or ultra-high resolution; and more importantly, it can be evaporated in order to pattern any non-flat or irregular surface such as an AFM cantilever or an optical fiber. I will also present out study using grafted mono-layer brush as e-beam resist for nanofabrication on irregular surfaces. I will then present our work on NIL using hard/soft bi-layer mold that have great advantages over conventional silicon mold.

Next, I will cover a few applications of nanostructures fabricated by NIL and EBL, notably metallic nanostructures for plasmonic applications. Lastly I will present the fabrication of high resolution probe for atomic force microscope (AFM), and hollow micro-needle arrays for point-of-care diagnostic applications.

报告人简介：

崔波博士现为加拿大滑铁卢大学电子与计算机工程系及滑铁卢纳米研究院副教授。1994年毕业于北京大学物理系获学士学位，2000年及2003年于美国普林斯顿大学电子工程系分别获硕士与博士学位，师从美国工程院院士Stephen Y Chou教授做纳米加工方面的研究。2003年至2008年在加拿大国家实验室（NRC）做研究。2008年11月加入滑铁卢大学至今。

其研究方向主要为纳米加工，包括纳米压印，电子束光刻，聚焦离子束，及薄膜镀膜与刻蚀技术的工艺研究，并应用于生物传感器，太阳能电池等领域。至今已发表期刊文章102篇，会议文章/报告100余次。申请专利4项（三项获批），编辑纳米加工方面的专著一本。2014年获得优秀科研奖（Engineering Research Excellence Award）。现为Nanoscale Research Letters的副主编。